光掩模在众多行业中充当着母版工具的角色，通过光刻工艺实现图案的精确复制。
我们拥有多年的光刻制造经验，现提供专业的光掩模生产服务。我们采用先进的电子束和直写激光系统，可生产 3 英寸见方至 32 英寸见方的光掩模，适用于多种玻璃基板，并提供多种涂层选择。我们还擅长在非标准基板上制造光掩模，厚度和尺寸均可根据您的具体要求进行精确定制。
如需讨论您的项目，请将具体要求发送电子邮件至 hedebio@163.com 。
Photomasks function as precision master templates, essential for the accurate pattern replication in photolithography across diverse high-tech industries.
Leveraging over a decade of specialization in photolithographic manufacturing, HEDE provides dedicated photomask production capabilities.
Utilizing state-of-the-art e-beam and direct-write laser lithography systems, we fabricate photomasks ranging from 3" to 32" square. Our services encompass a variety of glass substrates and coating options. We further excel in producing masks on non-standard substrates, with thicknesses and dimensions customized to meet exact application specifications.
To initiate a discussion regarding your project, please email your detailed requirements to hedebio@163.com
